THEORETICAL-ANALYSIS OF ELECTRICALLY EXCITED KRF LASER

被引：33

作者：

LACINA, WB

COHN, DB

机构：

来源：

APPLIED PHYSICS LETTERS | 1978年 / 32卷 / 02期

关键词：

D O I：

10.1063/1.89954

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：106 / 108

页数：3

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[1] HIGH-POWER XENON FLUORIDE LASER [J].

AULT, ER ;

BRADFORD, RS ;

BHAUMIK, ML .

APPLIED PHYSICS LETTERS, 1975, 27 (07) :413-415

[2]

BERGER MJ, 1967, 1133 NATL AC SCI PUB, pCH10

[3] HIGH-EFFICIENCY KRF EXCIMER LASER [J].

BHAUMIK, ML ;

BRADFORD, RS ;

AULT, ER .

APPLIED PHYSICS LETTERS, 1976, 28 (01) :23-24

[4] FLOWING AFTERGLOW STUDIES OF REACTIONS OF RARE-GAS MOLECULAR IONS HE2+, NE2+, AND AR2+WITH MOLEDULES AND RARE-GAS ATOMS [J].

BOHME, DK ;

ADAMS, NG ;

MOSESMAN, M ;

DUNKIN, DB ;

FERGUSON, EE .

JOURNAL OF CHEMICAL PHYSICS, 1970, 52 (10) :5094-+

[5] 354-NM LASER ACTION ON XEF [J].

BRAU, CA ;

EWING, JJ .

APPLIED PHYSICS LETTERS, 1975, 27 (08) :435-437

[6] EFFICIENT ELECTRIC-DISCHARGE LASERS IN XEF AND KRF [J].

BURNHAM, R ;

POWELL, FX ;

DJEU, N .

APPLIED PHYSICS LETTERS, 1976, 29 (01) :30-32

[7] ATTACHMENT-DOMINATED ELECTRON-BEAM-IONIZED DISCHARGES [J].

DAUGHERTY, JD ;

MANGANO, JA ;

JACOB, JH .

APPLIED PHYSICS LETTERS, 1976, 28 (10) :581-583

[8] ELECTRONIC STATES OF KRF [J].

DUNNING, TH ;

HAY, PJ .

APPLIED PHYSICS LETTERS, 1976, 28 (11) :649-651

[9] FORMATION AND QUENCHING OF XEF AND KRF ELECTRONIC EXCITED-STATES [J].

EDEN, JG ;

SEARLES, SK .

APPLIED PHYSICS LETTERS, 1976, 29 (06) :356-358

[10] LASER ACTION ON SIGMA-2+1-2 -] SIGMA-2+1-2 BANDS OF KRF AND XECL [J].

EWING, JJ ;

BRAU, CA .

APPLIED PHYSICS LETTERS, 1975, 27 (06) :350-352

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