THEORETICAL-ANALYSIS OF ELECTRICALLY EXCITED KRF LASER

被引：33

作者：

LACINA, WB

COHN, DB

机构：

来源：

APPLIED PHYSICS LETTERS | 1978年 / 32卷 / 02期

关键词：

D O I：

10.1063/1.89954

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：106 / 108

页数：3

共 32 条

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ROKNI, M ;

JACOB, JH ;

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BROCHU, R .

APPLIED PHYSICS LETTERS, 1977, 31 (02) :79-82

[24]

Schaper M., 1969, Beitraege aus der Plasma Physik, V9, P45, DOI 10.1002/ctpp.19690090105

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SEARLES, SK .

APPLIED PHYSICS LETTERS, 1974, 25 (12) :735-737

[26] STIMULATED EMISSION AT 281.8 NM FROM XEBR [J].

SEARLES, SK ;

HART, GA .

APPLIED PHYSICS LETTERS, 1975, 27 (04) :243-245

[27] LASER-EMISSION AT 3577 AND 3805 A IN ELECTRON-BEAM-PUMPED AR-N2 MIXTURES [J].

SEARLES, SK ;

HART, GA .

APPLIED PHYSICS LETTERS, 1974, 25 (01) :79-82

[28]

STEVENS WJ, COMMUNICATION

[29] BOUND-FREE EMISSION-SPECTRA OF DIATOMIC XENON HALIDES [J].

VELAZCO, JE ;

SETSER, DW .

JOURNAL OF CHEMICAL PHYSICS, 1975, 62 (05) :1990-1991

[30]

VELAZCO JE, 1976, J CHEM PHYS, V65, P3469

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