A SUB-0.5-MU-M BILEVEL LITHOGRAPHIC PROCESS USING THE DEEP-UV ELECTRON-BEAM RESIST P(SI-CMS)

[1] ANALYSIS OF THE SOLUBILITY BEHAVIOUR OF IRRADIATED POLYETHYLENE AND OTHER POLYMERS [J]. PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1959, 249 (1258): : 367 - 386

[2] Charlesby A., 1960, ATOMIC RAD POLYM

[3] MACDONALD SA, 1983, P AM CHEM SOC DIVISI, V49, P104

[4] NOVEMBRE A, 1984, ACS SYM SER, V266, P241

[5] Novembre A. E., 1986, Proceedings of the SPIE - The International Society for Optical Engineering, V631, P14, DOI 10.1117/12.963620

[6] OPTIMAL DEVELOPER SELECTION FOR NEGATIVE ACTING RESISTS [J]. POLYMER ENGINEERING AND SCIENCE, 1986, 26 (16) : 1158 - 1164

[7] REICHMANIS E, 1985, SOLID STATE TECHNOL, V28, P130

[8] CO-POLYMERS OF TRIMETHYLSILYLSTYRENE WITH CHLOROMETHYLSTYRENE FOR A BI-LAYER RESIST SYSTEM [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (09) : 1962 - 1964

[9] TAGAWA S, 1987, ACS SYM SER, V346, P37

[1] ANALYSIS OF THE SOLUBILITY BEHAVIOUR OF IRRADIATED POLYETHYLENE AND OTHER POLYMERS [J]. PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1959, 249 (1258): : 367 - 386

[2] Charlesby A., 1960, ATOMIC RAD POLYM

[3] MACDONALD SA, 1983, P AM CHEM SOC DIVISI, V49, P104

[4] NOVEMBRE A, 1984, ACS SYM SER, V266, P241

[5] Novembre A. E., 1986, Proceedings of the SPIE - The International Society for Optical Engineering, V631, P14, DOI 10.1117/12.963620

[6] OPTIMAL DEVELOPER SELECTION FOR NEGATIVE ACTING RESISTS [J]. POLYMER ENGINEERING AND SCIENCE, 1986, 26 (16) : 1158 - 1164

[7] REICHMANIS E, 1985, SOLID STATE TECHNOL, V28, P130

[8] CO-POLYMERS OF TRIMETHYLSILYLSTYRENE WITH CHLOROMETHYLSTYRENE FOR A BI-LAYER RESIST SYSTEM [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (09) : 1962 - 1964

[9] TAGAWA S, 1987, ACS SYM SER, V346, P37