SYNCHROTRON RADIATION ASSISTED DEPOSITION OF CARBON-FILMS

被引：22

作者：

OHASHI, H

INOUE, K

SAITO, Y

YOSHIDA, A

OGAWA, H

SHOBATAKE, K

机构：

[1] SAGA UNIV,FAC SCI & ENGN,SAGA 840,JAPAN

[2] INST MOLEC SCI,OKAZAKI,AICHI 444,JAPAN

来源：

APPLIED PHYSICS LETTERS | 1989年 / 55卷 / 16期

关键词：

D O I：

10.1063/1.102225

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1644 / 1646

页数：3

共 7 条

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[2] BONDING IN HYDROGENATED HARD CARBON STUDIED BY OPTICAL SPECTROSCOPY [J].

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[3]

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[4]

KOCH EE, 1976, INT J RADIAT PHYS CH, V31, P187

[5] SYNCHROTRON RADIATION-EXCITED CHEMICAL VAPOR-DEPOSITION OF SIXNYHZ FILM [J].

KYURAGI, H ;

URISU, T .

JOURNAL OF APPLIED PHYSICS, 1987, 61 (05) :2035-2037

[6] SYNCHROTRON RADIATION-EXCITED CHEMICAL-VAPOR DEPOSITION AND ETCHING [J].

URISU, T ;

KYURAGI, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (05) :1436-1440

[7]

1988, UVSOR16 ACT REP, P137

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