LOW-TEMPERATURE GROWTH OF POLYCRYSTALLINE SI AND GE FILMS BY ULTRAVIOLET-LASER PHOTO-DISSOCIATION OF SILANE AND GERMANE

被引：59

作者：

ANDREATTA, RW

ABELE, CC

OSMUNDSEN, JF

EDEN, JG

LUBBEN, D

GREENE, JE

机构：

[1] UNIV ILLINOIS,COORDINATED SCI LAB,DEPT MET,URBANA,IL 61801

[2] UNIV ILLINOIS,DEPT MET,MAT RES LAB,URBANA,IL 61801

来源：

APPLIED PHYSICS LETTERS | 1982年 / 40卷 / 02期

关键词：

D O I：

10.1063/1.93001

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：183 / 185

页数：3

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