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SILICON GRAPHOEPITAXY USING A STRIP-HEATER OVEN

被引：70
作者：
GEIS, MW
ANTONIADIS, DA
SILVERSMITH, DJ
MOUNTAIN, RW
SMITH, HI
机构：
来源：
APPLIED PHYSICS LETTERS | 1980年 / 37卷 / 05期
关键词：
D O I：
10.1063/1.91962
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：454 / 456
页数：3
相关论文
共 8 条
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    [J]. APPLIED PHYSICS LETTERS, 1978, 32 (02) : 112 - 114
  • [2] CW LASER ANNEAL OF POLYCRYSTALLINE SILICON - CRYSTALLINE-STRUCTURE, ELECTRICAL-PROPERTIES
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    [J]. APPLIED PHYSICS LETTERS, 1978, 33 (08) : 775 - 778
  • [3] CRYSTALLOGRAPHIC ORIENTATION OF SILICON ON AN AMORPHOUS SUBSTRATE USING AN ARTIFICIAL SURFACE-RELIEF GRATING AND LASER CRYSTALLIZATION
    GEIS, MW
    FLANDERS, DC
    SMITH, HI
    [J]. APPLIED PHYSICS LETTERS, 1979, 35 (01) : 71 - 74
  • [4] GRAPHO-EPITAXY OF SILICON ON FUSED-SILICA USING SURFACE MICROPATTERNS AND LASER CRYSTALLIZATION
    GEIS, MW
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    SMITH, HI
    ANTONIADIS, DA
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1640 - 1643
  • [5] GEIS MW, 1980, IEEE INT ELECTRON DE, P210
  • [6] REAL SPACE CRYSTALLOGRAPHY AND DEFECTS IN MOLECULAR-CRYSTALS
    JONES, W
    WILLIAMS, JO
    [J]. JOURNAL OF MATERIALS SCIENCE, 1975, 10 (03) : 379 - 386
  • [7] CRYSTAL-STRUCTURE AND THERMAL-OXIDATION OF LASER-RECRYSTALIZED POLYCRYSTALLINE SILICON
    KAMINS, TI
    LEE, KF
    GIBBONS, JF
    [J]. APPLIED PHYSICS LETTERS, 1980, 36 (07) : 550 - 553
  • [8] TAYLOR A, 1961, XRAY METALLOGRAPHY, P613
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