学术探索
学术期刊
新闻热点
数据分析
智能评审
立即登录
THE EFFECTS OF SURFACE-CHARGE ON SPREADING RESISTANCE PROFILES MEASURED ON P-ON-P+ EPITAXIAL SI WAFERS
被引:6
作者
:
BERKOWITZ, HL
论文数:
0
引用数:
0
h-index:
0
机构:
Solid State Measurements, Incorporated, Pittsburgh
BERKOWITZ, HL
机构
:
[1]
Solid State Measurements, Incorporated, Pittsburgh
来源
:
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
1990年
/ 137卷
/ 08期
关键词
:
D O I
:
10.1149/1.2086990
中图分类号
:
O646 [电化学、电解、磁化学];
学科分类号
:
081704 ;
摘要
:
Anomalous peaks in the resistivity profiles of p-on-p+ epi wafers as measured using spreading resistance analysis have been observed. The fact that these peaks have similar character and are observed on epi wafers from different sources makes it improbable that they are caused by compensating contaminants. Simulations of the spreading resistance profiles of such wafers are described which show that the anomalous peaks may be explained by the combined effects of charge near the surface and analysis by multilayer theory (the standard method for analyzing spreading resistance profiles). © 1990, The Electrochemical Society, Inc. All rights reserved.
引用
收藏
页码:2581 / 2585
页数:5
相关论文
共 17 条
[11]
SPREADING RESISTANCE CORRECTION FACTORS
SCHUMANN, PA
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Components Division, East Fishkill Facility, Hopewell Junction
SCHUMANN, PA
GARDNER, EE
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Components Division, East Fishkill Facility, Hopewell Junction
GARDNER, EE
[J].
SOLID-STATE ELECTRONICS,
1969,
12
(05)
: 371
-
&
[12]
Sze S. M., 1981, PHYSICS SEMICONDUCTO, P77
[13]
RESISTIVITY-DOPANT DENSITY RELATIONSHIP FOR BORON-DOPED SILICON
THURBER, WR
论文数:
0
引用数:
0
h-index:
0
机构:
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
THURBER, WR
MATTIS, RL
论文数:
0
引用数:
0
h-index:
0
机构:
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
MATTIS, RL
LIU, YM
论文数:
0
引用数:
0
h-index:
0
机构:
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
LIU, YM
FILLIBEN, JJ
论文数:
0
引用数:
0
h-index:
0
机构:
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
FILLIBEN, JJ
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1980,
127
(10)
: 2291
-
2294
[14]
RESISTIVITY-DOPANT DENSITY RELATIONSHIP FOR PHOSPHORUS-DOPED SILICON
THURBER, WR
论文数:
0
引用数:
0
h-index:
0
机构:
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
THURBER, WR
MATTIS, RL
论文数:
0
引用数:
0
h-index:
0
机构:
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
MATTIS, RL
LIU, YM
论文数:
0
引用数:
0
h-index:
0
机构:
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
LIU, YM
FILLIBEN, JJ
论文数:
0
引用数:
0
h-index:
0
机构:
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
FILLIBEN, JJ
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1980,
127
(08)
: 1807
-
1812
[15]
THURBER WR, NBS SPECIAL PUBLICAT
[16]
VANDERVORST W, 1988, ELECTROCHEMICAL SOC, P267
[17]
1982, ANN BOOK ASTM STANDA
←
1
2
→
共 17 条
[11]
SPREADING RESISTANCE CORRECTION FACTORS
SCHUMANN, PA
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Components Division, East Fishkill Facility, Hopewell Junction
SCHUMANN, PA
GARDNER, EE
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Components Division, East Fishkill Facility, Hopewell Junction
GARDNER, EE
[J].
SOLID-STATE ELECTRONICS,
1969,
12
(05)
: 371
-
&
[12]
Sze S. M., 1981, PHYSICS SEMICONDUCTO, P77
[13]
RESISTIVITY-DOPANT DENSITY RELATIONSHIP FOR BORON-DOPED SILICON
THURBER, WR
论文数:
0
引用数:
0
h-index:
0
机构:
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
THURBER, WR
MATTIS, RL
论文数:
0
引用数:
0
h-index:
0
机构:
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
MATTIS, RL
LIU, YM
论文数:
0
引用数:
0
h-index:
0
机构:
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
LIU, YM
FILLIBEN, JJ
论文数:
0
引用数:
0
h-index:
0
机构:
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
FILLIBEN, JJ
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1980,
127
(10)
: 2291
-
2294
[14]
RESISTIVITY-DOPANT DENSITY RELATIONSHIP FOR PHOSPHORUS-DOPED SILICON
THURBER, WR
论文数:
0
引用数:
0
h-index:
0
机构:
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
THURBER, WR
MATTIS, RL
论文数:
0
引用数:
0
h-index:
0
机构:
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
MATTIS, RL
LIU, YM
论文数:
0
引用数:
0
h-index:
0
机构:
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
LIU, YM
FILLIBEN, JJ
论文数:
0
引用数:
0
h-index:
0
机构:
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
NBS,DIV STAT ENGN,WASHINGTON,DC 20234
FILLIBEN, JJ
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1980,
127
(08)
: 1807
-
1812
[15]
THURBER WR, NBS SPECIAL PUBLICAT
[16]
VANDERVORST W, 1988, ELECTROCHEMICAL SOC, P267
[17]
1982, ANN BOOK ASTM STANDA
←
1
2
→