COMPARISON OF MOSSBAUER-SPECTRA OF CO-57 IN SILICON FOR HIGH-TEMPERATURE ION-IMPLANTED AND FOR DIFFUSED SAMPLES

被引:8
作者
WEYER, G
KETTSCHAU, A
GREBE, G
SCHROTER, W
BERGHOLZ, W
机构
[1] FREE UNIV BERLIN,INST ATOM & FESTKORPERPHYS,D-1000 BERLIN 33,FED REP GER
[2] UNIV GOTTINGEN,INST PHYS 4,D-3400 GOTTINGEN,FED REP GER
来源
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1979年 / 51卷 / 02期
关键词
D O I
10.1002/pssa.2210510218
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Si samples supersaturated with radioactive 57Co, prepared by the ion‐implantation and diffusion methods, are investigated by Mössbauer spectroscopy. Nearly identical spectra are observed for high‐temperature (≈ 600 °C) implanted samples and for diffused samples quenched from 1250 °C. The spectra are decomposed into four different lines. The intensities of these lines are found to depend on the annealing of the diffused samples and the implanted dose of the ion‐implanted samples. The lines are interpreted to be due to substitutionally dissolved Co atoms (δ = 0.53 mm/s) and to metastable precipitates (lines with isomer shifts δ ≈ −0.12 mm/s, δ ≈ 0.06 mm/s, and δ ≈ 0.23 mm/s). Copyright © 1979 WILEY‐VCH Verlag GmbH & Co. KGaA
引用
收藏
页码:459 / 466
页数:8
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