共 10 条
[1]
ABE K, 1981, J NUCL MATER, V103, P1169
[3]
X-RAY MACROSTRESS DETERMINATION ON TEXTURED MATERIAL - USE OF THE ODF FOR CALCULATING THE X-RAY COMPLIANCES
[J].
METALLURGICAL TRANSACTIONS A-PHYSICAL METALLURGY AND MATERIALS SCIENCE,
1987, 18 (07)
:1229-1238
[4]
STRESS AND RESISTIVITY CONTROL IN SPUTTERED MOLYBDENUM FILMS AND COMPARISON WITH SPUTTERED GOLD
[J].
METALLURGICAL TRANSACTIONS,
1971, 2 (03)
:699-&
[7]
THE INFLUENCE OF DISCHARGE CURRENT ON THE INTRINSIC STRESS IN MO FILMS DEPOSITED USING CYLINDRICAL AND PLANAR MAGNETRON SPUTTERING SOURCES
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1985, 3 (03)
:576-579
[8]
INFLUENCE OF APPARATUS GEOMETRY AND DEPOSITION CONDITIONS ON STRUCTURE AND TOPOGRAPHY OF THICK SPUTTERED COATINGS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1974, 11 (04)
:666-670
[9]
REDISTRIBUTION OF IMPLANTED NOBLE-GAS ATOMS BY SELF-INTERSTITIALS IN MOLYBDENUM AND NICKEL
[J].
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH,
1983, 209 (MAY)
:1055-1061
[10]
CONTROL OF THIN-FILM ORIENTATION BY GLANCING ANGLE ION-BOMBARDMENT DURING GROWTH
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1986, 4 (03)
:443-447