DIGITAL GAAS-FET VERSUS SI FET GATE DELAY AS PREDICTED FROM THE ELECTRON VELOCITY

被引:1
作者
FULKERSON, DE
机构
[1] Honeywell Systems and Research Center, Bloomington, MN, 55420.
关键词
D O I
10.1109/16.123507
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This brief constructs a FET model that takes into account the effective saturation velocity (including the effect of velocity overshoot), fringing capacitance, and source resistance. The model is applied to identical differential source-coupled FET logic gates in both GaAs and Si. The simulated gate delay of the Si logic gate is about 2.6 times that of the GaAs gate, thus refuting the common hypothesis that GaAs and Si delays should be about equal because their equilibrium saturated electron velocities are about equal.
引用
收藏
页码:745 / 748
页数:4
相关论文
共 17 条
[1]  
DRUMMOND T, 1982, IEEE ELECT DEVICE LE, V3, P339
[2]   MONTE-CARLO SIMULATION OF TRANSPORT IN TECHNOLOGICALLY SIGNIFICANT SEMICONDUCTORS OF THE DIAMOND AND ZINCBLENDE STRUCTURES .2. SUBMICROMETER MOSFETS [J].
FISCHETTI, MV ;
LAUX, SE .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1991, 38 (03) :650-660
[3]   DETERMINATION OF EQUIVALENT NETWORK PARAMETERS OF SHORT-GATE-LENGTH MODULATION-DOPED FIELD-EFFECT TRANSISTORS [J].
FU, ST ;
LIU, SMJ ;
DAS, MB .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1990, 37 (04) :888-901
[4]   HIGH-PERFORMANCE STANDARD CELL LIBRARY AND MODELING TECHNIQUE FOR DIFFERENTIAL ADVANCED BIPOLAR CURRENT TREE LOGIC [J].
GREUB, HJ ;
MCDONALD, JF ;
CREEDON, T ;
YAMAGUCHI, T .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1991, 26 (05) :749-762
[5]  
Grider D. E., 1990, 12th Annual GaAs IC Symposium. Technical Digest 1990 (Cat. No.90CH2889-4), P143, DOI 10.1109/GAAS.1990.175471
[6]  
JENSEN KJ, 1987, 1987 GAAS IC S TECH, P201
[7]   SIMULATION OF A GAAS-MESFET INCLUDING VELOCITY OVERSHOOT - AN EXTENDED DRIFT-DIFFUSION FORMALISM [J].
KIZILYALLI, IC ;
ARTAKI, M .
IEEE ELECTRON DEVICE LETTERS, 1989, 10 (09) :405-408
[8]  
KURISU M, 1991, 1991 INT SOL STAT CI, P158
[9]   ANALYTICAL MODEL FOR IV CHARACTERISTICS OF ION-IMPLANTED MESFETS WITH HEAVILY DOPED CHANNEL [J].
MOHAMMAD, SN ;
PATIL, MB ;
CHYI, JI ;
GAO, GB ;
MORKOC, H .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1990, 37 (01) :11-20
[10]   HIGH-PERFORMANCE SUBQUARTER-MICROMETER GATE CMOS TECHNOLOGY [J].
OKAZAKI, Y ;
KOBAYASHI, T ;
MIYAKE, M ;
MATSUDA, T ;
SAKUMA, K ;
KAWAI, Y ;
TAKAHASHI, M ;
KANISAWA, K .
IEEE ELECTRON DEVICE LETTERS, 1990, 11 (04) :134-136