FABRICATION OF HARD X-RAY PHASE ZONE-PLATE BY X-RAY-LITHOGRAPHY

被引：25

作者：

KRASNOPEROVA, AA

XIAO, J

CERRINA, F

DIFABRIZIO, E

LUCIANI, L

FIGLIOMENI, M

GENTILI, M

机构：

[1] CNR IESS,I-00156 ROME,ITALY

[2] ARGONNE NATL LAB,ARGONNE,IL 60439

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1993年 / 11卷 / 06期

关键词：

D O I：

10.1116/1.586630

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Fresnel phase zone plates for hard x-ray microfocusing have been fabricated. An original x-ray mask written by e-beam lithography was replicated into thick PMMA by x-ray proximity printing. The pattern was transferred into gold and nickel by electroplating. A smallest linewidth of 0.25 mum with an aspect ratio of 14 in the metal pattern has been achieved. Thickness of fabricated zone plates was dictated by a pi-phase shift requirement for focusing of the x rays at 8 and 20 keV energies.

引用

页码：2588 / 2591

页数：4

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