MULTICHIP PACKAGING FOR VERY-HIGH-SPEED DIGITAL-SYSTEMS

被引:9
作者
BERNHARDT, AF
BARFKNECHT, AT
CONTOLINI, RJ
MALBA, V
MAYER, ST
RALEY, NF
TUCKERMAN, DB
机构
基金
美国能源部;
关键词
D O I
10.1016/0169-4332(90)90130-R
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
High-speed computing systems are limited by integrated circuit (IC) packaging technology. For system speed and compactness, IC's should be bonded in close proximity; however, this leads to heat-dissipation problems with conventional packaging. Residual inductance in chip-to-board connections also limits system speed. A packaging technology is being developed for very-high-speed, compact, and rugged computing systems, which is particularly well suited to high-power and high-I/O systems. A complete package consists of IC's bonded to a silicon circuit board (SiCB) which is, in turn, bonded to a microchannel heat-sink. The thin-film, eutectic bond between silicon dice and the SiCB provides intimate thermal and mechanical contact. The SiCB provides speed-of-light interconnect between IC's using SiO2 as the dielectric and copper metallization. A novel electrochemical metal planarization process is used in applications requiring multiple levels of interconnection on the silicon circuit board. Laser patterning permits chip-to-SiCB interconnect to be fabricated directly on the vertical walls of attached die, which results in higher I/O density and better electrical characteristics than allowed by wire bonding or tape automated bonding (TAB). Incorporation of the microchannel heat-sink reduces overall package thermal resistance per unit area by a factor of more than 50 compared to conventional technology. Memory modules have been produced with the technology and tested according to US space qualification procedures. Enhanced thermal-shock tests (500 K temperature change, 10 s cycle time) have demonstrated the ruggedness of the technology. © 1990.
引用
收藏
页码:121 / 130
页数:10
相关论文
共 9 条
[1]  
Balderes D., 1985, 35th Electronic Components Conference (Cat. No. 85CH2184-0), P351
[2]  
BARFKNECHT AT, 1989, MANUF TECHNOL CHMT, V12, P646
[3]  
CONTOLINI R, 1989, EL EXT ABSTR, V891, P266
[4]   LASER CHEMICAL TECHNIQUE FOR RAPID DIRECT WRITING OF SURFACE RELIEF IN SILICON [J].
EHRLICH, DJ ;
OSGOOD, RM ;
DEUTSCH, TF .
APPLIED PHYSICS LETTERS, 1981, 38 (12) :1018-1020
[5]  
KASCHMITTER JL, 1989, GOVT MICROCIRCUIT AP, V15, P27
[6]   COMPARISON OF WAFER SCALE INTEGRATION WITH VLSI PACKAGING APPROACHES [J].
NEUGEBAUER, CA ;
CARLSON, RO .
IEEE TRANSACTIONS ON COMPONENTS HYBRIDS AND MANUFACTURING TECHNOLOGY, 1987, 10 (02) :184-189
[7]  
SURYANARAYANA D, 1990, 40TH ELECTRONIC COMPONENTS AND TECHNOLOGY CONFERENCE, VOLS 1 AND 2, P338, DOI 10.1109/ECTC.1990.122212
[8]   LASER-PATTERNED INTERCONNECT FOR THIN-FILM HYBRID WAFER-SCALE CIRCUITS [J].
TUCKERMAN, DB .
IEEE ELECTRON DEVICE LETTERS, 1987, 8 (11) :540-543
[9]   HIGH-PERFORMANCE HEAT SINKING FOR VLSI [J].
TUCKERMAN, DB ;
PEASE, RFW .
ELECTRON DEVICE LETTERS, 1981, 2 (05) :126-129