ENERGY DEPOSITION AND SUBSTRATE HEATING DURING MAGNETRON SPUTTERING

The mechanism of energy transport by particles from the target of a planar magnetron sputter source to the substrate is investigated. Analysis of the substrate heating gives information about the total energy transported by particles. Subsequent model calculations allow us to distinguish between different energy transport mechanisms like electronic bombardment, ionic bombardment, motion of sputter particles and high energetic neutral bombardment. Relevant factors are the arrival rates, relative to the sputter current, of high energetic neutrals (gamma = 0.018), the escape probability of high energetic electrons (eta = 0.008) and the effective substrate bias which is about 50% of the applied substrate potential.