EFFECT OF SUBSTRATE BIAS ON TANTALUM FILMS SPUTTERED IN AN OXYGEN-ARGON MIXTURE

被引：27

作者：

WESTWOOD, WD

WILCOX, PS

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1971年 / 42卷 / 10期

关键词：

D O I：

10.1063/1.1659724

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4055 / &

共 28 条

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