ELECTRONIC-STRUCTURE AND PROPERTIES OF SPUTTERED TA-CU FILMS

被引：9

作者：

AYLESWORTH, KD

JASWAL, SS

ENGELHARDT, MA

ZHAO, ZR

SELLMYER, DJ

机构：

来源：

PHYSICAL REVIEW B | 1988年 / 37卷 / 05期

关键词：

D O I：

10.1103/PhysRevB.37.2426

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：2426 / 2432

页数：7

共 36 条

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