ELECTRONIC-STRUCTURE AND PROPERTIES OF SPUTTERED TA-CU FILMS

被引:9
作者
AYLESWORTH, KD
JASWAL, SS
ENGELHARDT, MA
ZHAO, ZR
SELLMYER, DJ
机构
来源
PHYSICAL REVIEW B | 1988年 / 37卷 / 05期
关键词
D O I
10.1103/PhysRevB.37.2426
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:2426 / 2432
页数:7
相关论文
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