INTERDIFFUSION AND GRAIN ISOLATION IN CO/CR THIN-FILMS

被引:17
作者
FENG, YC [1 ]
LAUGHLIN, DE [1 ]
LAMBETH, DN [1 ]
机构
[1] CARNEGIE MELLON UNIV,CTR DATA STORAGE SYST,DEPT ELECT & COMP ENGN,PITTSBURGH,PA 15213
基金
美国国家科学基金会; 美国安德鲁·梅隆基金会;
关键词
D O I
10.1109/20.333953
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this work, interdiffusion and grain isolation in Co/Cr films have been investigated by studying the dependence of the magnetic properties on the substrate preheating temperature as well as on post-deposition annealing processes. By choosing pure Co instead of Co-alloy, the possibility of grain isolation caused by the segregation of solute atoms from within the magnetic layer had been eliminated. It is found that both post-deposition thermal annealing and substrate preheating can effectively increase the isolation of the Co grains.
引用
收藏
页码:3948 / 3950
页数:3
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