LASER ANNEALING SI COVERED WITH A METAL-FILM - TEST FOR GROWTH FROM THE MELT

被引：1

作者：

VANVECHTEN, JA

机构：

来源：

关键词：

D O I：

10.1103/PhysRevLett.47.283

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：283 / 283

页数：1

共 8 条

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[2] LASER ANNEALING OF DAMAGED SILICON COVERED WITH A METAL-FILM - TEST FOR EPITAXIAL-GROWTH FROM THE MELT
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COHEN, C
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[3] LASER SHOCK HARDENING OF WELD ZONES IN ALUMINUM-ALLOYS
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FAIRAND, BP
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[J]. METALLURGICAL TRANSACTIONS A-PHYSICAL METALLURGY AND MATERIALS SCIENCE, 1977, 8 (12): : 1871 - 1876
[4] MORUZZI VL, 1978, CALCULATED ELECTRONI, P69
[5] ATTENUATION LENGTHS OF LOW-ENERGY ELECTRONS IN SOLIDS
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[J]. SURFACE SCIENCE, 1974, 44 (01) : 29 - 46
[6] SCHIFF LI, 1955, QUANTUM MECHANICS, P168
[7] VANVECHTEN JA, 1980, 11TH P INT C DEF RAD
[8] VANVECHTEN JA, 1980, J PHYS-PARIS, V41, P15