X-RAY PHOTOELECTRON-SPECTROSCOPY AND AUGER-SPECTROSCOPY STUDIES OF THIN SILICON-NITRIDE FILMS THERMALLY GROWN ON SILICON

被引：31

作者：

SOBOLEWSKI, MA

HELMS, CR

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期

关键词：

D O I：

10.1116/1.575702

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1358 / 1362

页数：5

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