EXO-DIFFUSION OF HYDROGEN IN AMORPHOUS-SILICON

被引:29
作者
ZELLAMA, K
GERMAIN, P
SQUELARD, S
MONGE, J
LIGEON, E
机构
[1] UNIV PARIS 7,F-75221 PARIS 05,FRANCE
[2] CEN,CEA,DEPT PHYS FONDAMENTALE,F-38041 GRENOBLE,FRANCE
关键词
D O I
10.1016/0022-3093(80)90598-0
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:225 / 230
页数:6
相关论文
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