PREPARATION OF BISRCACUO SUPERCONDUCTING THIN-FILM BY MOLECULAR-BEAM EPITAXY WITH NO2

被引:10
作者
OGIHARA, M
ABE, H
YAMADA, T
机构
[1] Research & Development Group, Oki Electric Industry Co Ltd., Hachioji-shi, Tokyo, 193, 550-5, Higashiasakawa-cho
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1991年 / 30卷 / 4B期
关键词
NO2; MBE; BISRCACUO; OXIDATION;
D O I
10.1143/JJAP.30.L703
中图分类号
O59 [应用物理学];
学科分类号
摘要
A BiSrCaCuO superconducting thin film was prepared in situ by molecular beam epitaxy with nitric dioxide gas (NO2). Metal sources were coevaporated onto the MgO (100) substrate at the substrate temperature of approximately 700-degrees-C under the background pressure of the growth chamber of approximately 5 x 10(-6) Torr. The deposition speed was approximately 1.8 angstrom/s and the thickness of the thin film was approximately 3000 angstrom. The zero resistance was obtained at 65 K without the annealing steps. The quality of the BiSrCaCuO superconducting thin film prepared with NO2 is comparable to that prepared with distilled ozone under identical growth condition except for the distilled ozone flux intensity. Oxidation behaviors of NO2 were studied and are compared with those of distilled ozone.
引用
收藏
页码:L703 / L705
页数:3
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