SPUTTERING OF METALS BY HYDROGEN IONS

被引：47

作者：

KENKNIGHT, CE

WEHNER, GK

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1964年 / 35卷 / 02期

关键词：

D O I：

10.1063/1.1713308

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：322 / &

共 11 条

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ROL, PK ;

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[2] SPUTTERING OF SILVER BY LIGHT IONS WITH ENERGIES FROM 2 TO 12 KEV [J].

GRONLUND, F ;

MOORE, WJ .

JOURNAL OF CHEMICAL PHYSICS, 1960, 32 (05) :1540-1545

[3]

GUSEV VM, 1960, IZV AN SSSR FIZ, V24, P689

[4] SPUTTERING YIELDS OF METALS FOR AR+ AND NE+ IONS WITH ENERGIES FROM 50 TO 600 EV [J].

LAEGREID, N ;

WEHNER, GK .

JOURNAL OF APPLIED PHYSICS, 1961, 32 (03) :365-&

[5] SPUTTERING OF SILVER BY HYDROGEN IONS [J].

OBRIAIN, CD ;

LINDNER, A ;

MOORE, WJ .

JOURNAL OF CHEMICAL PHYSICS, 1958, 29 (01) :3-7

[6] Rectilinear electron flow in beams [J].

Pierce, JR .

JOURNAL OF APPLIED PHYSICS, 1940, 11 (08) :548-554

[7] SPUTTERING YIELDS FOR LOW ENERGY HE+-, KR+-, AND XE+-ION BOMBARDMENT [J].

ROSENBERG, D ;

WEHNER, GK .

JOURNAL OF APPLIED PHYSICS, 1962, 33 (05) :1842-&

[8]

VONARDENNE M, 1956, TABELLEN ELEKTRONENP, V1, P543

[9]

WEHNER GK, 1961, J APPL PHYS, V31, P887

[10] SURFACE CLEANING BY CATHODE SPUTTERING [J].

YONTS, OC ;

HARRISON, DE .

JOURNAL OF APPLIED PHYSICS, 1960, 31 (09) :1583-1584

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