LOW-TEMPERATURE-PROCESSED (150-175-DEGREES-C) GE/PD-BASED OHMIC CONTACTS(RHO(C)SIMILAR-TO-1X10(-6)OMEGA-CM(2)) TO N-GAAS

被引:42
作者
WANG, LC [1 ]
HAO, PH [1 ]
WU, BJ [1 ]
机构
[1] THREE M CO,PHOTON RES LAB,ST PAUL,MN 55144
关键词
D O I
10.1063/1.114552
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have developed low resistance (rho(c) similar to 1x10(-6) Omega cm(2)) Ge/Pd-based (the Au/Ge/Pd and the Ag/Ge/Pd contacts) Ohmic contact schemes processed at temperatures 150-175 degrees C to n-GaAs (n similar to 1x10(18) cm(-3)). The Ohmic contact formation mechanism can be rationalized in terms of the solid phase regrowth (SPR) principle and the interdiffusion between Au (or Ag) and Ge. (C) 1995 American Institute of Physics.
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页码:509 / 511
页数:3
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