ANALYSIS OF THE THERMAL CONTRIBUTION TO UV LASER-INDUCED OXIDATION OF SILICON AND SILICON MONOXIDE

被引：9

作者：

FOGARASSY, E

UNAMUNO, S

REGOLINI, JL

FUCHS, C

机构：

来源：

PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES | 1987年 / 55卷 / 02期

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D O I：

10.1080/13642818708211207

中图分类号：

T [工业技术];

学科分类号：

08 ;

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页码：253 / 260

页数：8

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