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SURFACE-COMPOSITION AND ELECTROCHEMICAL PROPERTIES OF HIGH-DOSE CARBON-IMPLANTED IRON

被引：8
作者：
FUJIHANA, T
TAKAHASHI, K
SEKIGUCHI, A
IWAKI, M
机构：
[1] SAITAMA UNIV, URAWA, SAITAMA 338, JAPAN
[2] SCI UNIV TOKYO, NODA, CHIBA 278, JAPAN
[3] INST PHYS & CHEM RES, WAKO, SAITAMA 351, JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1990年 / 29卷 / 10期
关键词：
Anodic dissolution; Carbon ion implantation; Corrosion protection; Iron; Multisweep cyclic voltammetry; X-ray photoelectron spectroscopy;
D O I：
10.1143/JJAP.29.L1895
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The effect of high-dose C+-implantation on the anodic dissolution properties of iron was studied by multisweep cyclic voltammetry in an acetate buffer solution of pH 5.0. Implantation of 12C+was performed with a dose of 1×1018ions/cm2at an energy of 100 keV. The XPS was used to analyze the depth profile and chemical bonding state of carbon in the surface layers of C+-implanted iron. High-dose C+-implantation was extremely effective in suppression the anodic dissolution of iron in the solution. The dissolution process is discussed from the depth profiles measured before and after electrochemical treatments. © 1990 IOP Publishing Ltd.
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收藏
页码：L1895 / L1897
页数：3
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