Josephson-Junction Driven Submillimeter Wave Microstrip Resonator

被引：10

作者：

Bi, Baokang ^{[1
]}

Wan, K. ^{[1
]}

Zhang, Wenxing ^{[1
]}

Han, Siyuan ^{[1
]}

Lukens, James E. ^{[1
]}

机构：

[1] SUNY Stony Brook, Dept Phys, Stony Brook, NY 11794 USA

来源：

IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY | 1991年 / 1卷 / 04期

关键词：

D O I：

10.1109/77.107398

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A microstrip resonator driven by a resistively shunted Josephson junction has been used for submillimeter wave surface resistance measurements to about 400 GHz. A simple, analytical analysis of the resonator induced structure in the junction's I-V characteristic gives the resonator surface resistance in the range of 2-160 m Omega with an accuracy of better than 30%.

引用

页码：145 / 149

页数：5

共 17 条

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