THE EFFECT OF SUBSTRATE-TEMPERATURE ON THE PROPERTIES OF SPUTTERED TIN OXIDE-FILMS

被引:15
作者
MENG, LJ
DOSSANTOS, MP
机构
[1] Physics Department, Minho University
关键词
D O I
10.1016/0040-6090(94)90246-1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Tin oxide thin films have been deposited on glass substrates by the d.c. reactive magnetron sputtering method. The dependence of electrical, structural and optical properties of films on the substrate temperature was studied. The single-oscillator model was used to fit the dispersion of the refractive index with the wavelength. Rayleigh-type scattering was assumed for explaining the variation of the transmittance.
引用
收藏
页码:112 / 117
页数:6
相关论文
共 21 条
[1]   CORRELATION BETWEEN STRUCTURAL AND ELECTRICAL-PROPERTIES OF SPRAYED TIN OXIDE-FILMS WITH AND WITHOUT FLUORINE DOPING [J].
BRUNEAUX, J ;
CACHET, H ;
FROMENT, M ;
MESSAD, A .
THIN SOLID FILMS, 1991, 197 (1-2) :129-142
[2]   TRANSPARENT CONDUCTORS - A STATUS REVIEW [J].
CHOPRA, KL ;
MAJOR, S ;
PANDYA, DK .
THIN SOLID FILMS, 1983, 102 (01) :1-46
[3]   OPTICAL-PROPERTIES OF NON-STOICHIOMETRIC TIN OXIDE-FILMS OBTAINED BY REACTIVE SPUTTERING [J].
CZAPLA, A ;
KUSIOR, E ;
BUCKO, M .
THIN SOLID FILMS, 1989, 182 :15-22
[4]  
MURTHY NS, 1984, J I ELECTRON TELECOM, V30, P97
[5]   EFFECT OF DEPOSITION PARAMETERS ON THE MICROSTRUCTURE OF CHEMICALLY VAPOUR-DEPOSITED SNO2 FILMS [J].
MURTY, NS ;
JAWALEKAR, SR .
THIN SOLID FILMS, 1983, 102 (04) :283-289
[6]   STRUCTURE AND MORPHOLOGY OF THIN SNO2 FILMS [J].
POPOVA, LI ;
MICHAILOV, MG ;
GUEORGUIEV, VK ;
SHOPOV, A .
THIN SOLID FILMS, 1990, 186 (01) :107-112
[7]   THIN-FILM DEPOSITION BY MAGNETRON SPUTTERING AND DETERMINATION OF SOME PHYSICAL PARAMETERS [J].
RAMOS, MMD ;
ALMEIDA, JB ;
FERREIRA, MIC ;
DOSSANTOS, MP .
THIN SOLID FILMS, 1989, 176 (02) :219-226
[8]   GROWTH AND CHARACTERIZATION OF TIN OXIDE-FILMS PREPARED BY CHEMICAL VAPOR-DEPOSITION [J].
SANON, G ;
RUP, R ;
MANSINGH, A .
THIN SOLID FILMS, 1990, 190 (02) :287-301
[9]   PROPERTIES OF CONDUCTIVE ZINC-OXIDE FILMS FOR TRANSPARENT ELECTRODE APPLICATIONS PREPARED BY RF MAGNETRON SPUTTERING [J].
SCHROPP, REI ;
MADAN, A .
JOURNAL OF APPLIED PHYSICS, 1989, 66 (05) :2027-2031
[10]   CHEMICAL VAPOR-DEPOSITION OF TIN OXIDE-FILMS AND THEIR ELECTRICAL-PROPERTIES [J].
SUNDARAM, KB ;
BHAGAVAT, GK .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1981, 14 (02) :333-338