A MASS-SPECTROMETRY STUDY OF THE GAS PYROLYSIS OF PH3 AND A PH3/SI2H6 MIXTURE

被引：7

作者：

SIMON, J

FEURER, R

REYNES, A

MORANCHO, R

机构：

[1] Laboratoire des Matériaux (U.R.A. 445) C.N.R.S., E.N.S.C.T., F-31077 Toulouse Cedex

来源：

JOURNAL OF ANALYTICAL AND APPLIED PYROLYSIS | 1993年 / 26卷 / 01期

关键词：

DISILANE; MASS SPECTROMETRY; PHOSPHINE; PYROLYSIS; SILICON THIN FILMS;

D O I：

10.1016/0165-2370(93)85016-R

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

The thermal dissociation of phosphine and of a phosphine-disilane gas mixture as a function of temperature has been studied in an impinging jet type LPCVD reactor. In order to measure the influence of homogeneous gas phase reactions, two configurations (cold and hot wall) were used. A quadrupole mass spectrometer (QMS) coupled with the reactor using a sampling system near the substrate surface was used to follow the gas phase composition. PH3 begins to decompose at 550-degrees-C. Formation of the phosphorus dimer (P2) and tetramer (P4) is demonstrated; P4 is the main product. When Si2H6 is added to this gaseous mixture, formation of monosiiylphosphine SiPH5 is observed.

引用

页码：27 / 36

页数：10

共 17 条

[1] PHOSPHORUS-DOPED SILICON FILMS PREPARED BY LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF DISILANE AND PHOSPHINE [J].