DC BIAS EFFECTS ON GROWTH OF A-GE-H IN COAXIAL-TYPE ECR PLASMA

被引：6

作者：

AOKI, T ^{[1
]}

KATO, S ^{[1
]}

HIROSE, M ^{[1
]}

NISHIKAWA, Y ^{[1
]}

机构：

[1] HIROSHIMA UNIV,DEPT ELECT ENGN,HIROSHIMA 724,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1989年 / 28卷 / 05期

关键词：

D O I：

10.1143/JJAP.28.849

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：849 / 855

页数：7

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