OPTIMIZING DEPOSITION PARAMETERS OF ELECTRON-BEAM EVAPORATED TIO2 FILMS

被引:28
作者
LEHMANN, HW
FRICK, K
机构
来源
APPLIED OPTICS | 1988年 / 27卷 / 23期
关键词
D O I
10.1364/AO.27.004920
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
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页码:4920 / 4924
页数:5
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