THE EFFECT OF ION-IMPLANTED YTTRIUM ON THE OXIDATION OF NICKEL

被引：15

作者：

HAMPIKIAN, JM

DEVEREUX, OF

POTTER, DI

机构：

来源：

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 1989年 / 116卷

关键词：

D O I：

10.1016/0921-5093(89)90136-6

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：119 / 127

页数：9

共 11 条

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[2] GENERAL RELATIONSHIP FOR THERMAL OXIDATION OF SILICON
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[5] THE INFLUENCE OF IMPLANTED DOPANTS ON STRESSES AND DIFFUSION-PROCESSES IN NIO FILMS DURING THERMAL-OXIDATION OF NI
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[6] EFFECT OF YTTRIUM ADDITIONS ON THE OXIDATION OF NICKEL
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[J]. OXIDATION OF METALS, 1985, 24 (3-4): : 133 - 148
[7] Smith JV, 1960, XRAY POWER DATA FILE
[8] THE OXIDATION OF CHROMIUM-IMPLANTED AND NICKEL-IMPLANTED NICKEL AT HIGH-TEMPERATURES
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[J]. CORROSION SCIENCE, 1982, 22 (04) : 305 - 320
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