EFFECT OF GAS-COMPOSITION ON TEXTURE OF DIAMOND FILMS

被引：26

作者：

MARINELLI, M

MILANI, E

MONTUORI, M

PAOLETTI, A

PAROLI, P

THOMAS, J

机构：

[1] Dipartimento di Ingegneria Meccanica, II Università di Roma Tor Vergata, I-00133 Roma, Via della Ricerca Scientifica

来源：

APPLIED PHYSICS LETTERS | 1994年 / 65卷 / 22期

关键词：

D O I：

10.1063/1.112537

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Textured diamond films have been deposited on single-crystal silicon substrates by microwave plasma-enhanced chemical vapor deposition. Several unconventional gas mixtures (CO2-CH4, CO 2-C2H6, and CO2-C2H 4) were used in order to study the texturing formation within the diamond stability region in the C-O-H phase diagram. Optical emission spectroscopy was used to monitor the compositional dependence of the plasma emission. The obtained diamond films were characterized by scanning electron microscopy and x-ray diffraction. Diamond films deposited with all the gas mixtures showed very similar surface morphologies and (100) texturing was achieved only within a very narrow compositional range. Finally, a correlation was found between texturing conditions and CH and C2 line intensities in the plasma emission spectra. © 1994 American Institute of Physics.

引用

页码：2839 / 2841

页数：3

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