DEVELOPMENT OF BORON LIQUID-METAL ION-SOURCE FOR FOCUSED ION-BEAM SYSTEM

被引：13

作者：

HIGUCHIRUSLI, RH

CADIEN, KC

CORELLI, JC

STECKL, AJ

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 01期

关键词：

D O I：

10.1116/1.583860

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：190 / 194

页数：5

共 12 条

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[2]

Elliot R.P, 1965, CONSTITUTION BINARY

[3] LIQUID-METAL ALLOY ION SOURCES FOR B, SB, AND SI [J].

GAMO, K ;

UKEGAWA, T ;

INOMOTO, Y ;

OCHIAI, Y ;

NAMBA, S .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :1182-1185

[4]

HIGUCHIRUSLI RH, 1986, THESIS RENSSELAER PO

[5]

HREN JE, 1968, FIELD ION MICROSCOPY, P64

[6] DEVELOPMENT OF BORON LIQUID-METAL-ION SOURCE [J].

ISHITANI, T ;

UMEMURA, K ;

HOSOKI, S ;

TAKAYAMA, S ;

TAMURA, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (03) :1365-1369

[7]

ISHITANI T, 1984, JPN J APPL PHYS, V23, P330

[8]

ISHITANI T, 1982, JPN J APPL PHYS, V21, P277

[9]

KUBENA PL, 1981, J VAC SCI TECHNOL, V10, P916

[10]

MOFFATT WG, 1981, HDB BINARY PHASE DIA, V1

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