QUANTITATIVE-ANALYSIS OF INTERFACIAL IMPURITIES USING SECONDARY-ION MASS-SPECTROMETRY

被引:35
作者
WILLIAMS, P
BAKER, JE
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10.1063/1.91343
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O59 [应用物理学];
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页码:842 / 845
页数:4
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共 12 条
[1]  
Allmen Daniel Von, COMMUNICATION
[2]  
ALLMEN MV, 1979, 156TH P M EL SOC LOS
[3]  
DELINE VR, 1979, APPL PHYS LETT, V33, P932
[4]  
DELINE VR, 1978, THESIS U ILLINOIS
[5]   INFLUENCE OF ATOMIC MIXING AND PREFERENTIAL SPUTTERING ON DEPTH PROFILES AND INTERFACES [J].
LIAU, ZL ;
TSAUR, BY ;
MAYER, JW .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02) :121-127
[6]   SPUTTERING OF PTSI [J].
LIAU, ZL ;
MAYER, JW ;
BROWN, WL ;
POATE, JM .
JOURNAL OF APPLIED PHYSICS, 1978, 49 (10) :5295-5305
[7]   RECOIL MIXING IN SOLIDS BY ENERGETIC ION-BEAMS [J].
LITTMARK, U ;
HOFER, WO .
NUCLEAR INSTRUMENTS & METHODS, 1980, 168 (1-3) :329-342
[8]  
MAGEE CW, COMMUNICATION
[9]   SPUTTERING PROCESS AND SPUTTERED ION EMISSION [J].
WILLIAMS, P .
SURFACE SCIENCE, 1979, 90 (02) :588-634
[10]   EVALUATION OF A CESIUM PRIMARY ION-SOURCE ON AN ION MICROPROBE MASS-SPECTROMETER [J].
WILLIAMS, P ;
LEWIS, RK ;
EVANS, CA ;
HANLEY, PR .
ANALYTICAL CHEMISTRY, 1977, 49 (09) :1399-1403