DETECTION LIMIT AND SENSITIVITY IN PIXE ANALYSIS OF THICK SAMPLES

被引:4
作者
GARTEN, RPH
GROENEVELD, KO
KONIG, KH
SCHADER, J
机构
关键词
D O I
10.1109/TNS.1979.4330391
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Proton induced x-ray emission (PIXE) is a well established tool in trace element analysis of thin samples. Energy loss, self-absorption and reexcitation, however, present serious problems for trace element analysis of thick samples. For a systematic study thick samples have been produced on the basis of synthetic glass with 3 to 5 different lanthanoids of various concentrations. The dependence of detection limit and sensitivity on such parameters as concentration or combination of elements has been investigated. A comparison is given of x-ray spectrometry in different methods (PIXE, scanning electron microscope, electron microprobe). Copyright © 1978 by The Institute of Electrical and Electronics Engineers, Inc.
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页码:1381 / 1383
页数:3
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