PULSED ELECTRON-BEAM PROCESSING OF MATERIAL-SURFACES

被引：3

作者：

GREENWALD, AC

KIRKPATRICK, AR

LITTLE, RG

MINNUCCI, JA

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 06期

关键词：

D O I：

10.1116/1.570307

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1838 / 1839

页数：2

共 14 条

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JOURNAL OF APPLIED PHYSICS, 1979, 50 (02) :783-787

[3]

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[4]

HIRVONEN JK, UNPUBLISHED

[5] PULSED-ELECTRON-BEAM ANNEALING OF POLYCRYSTALLINE-SILICON FILMS [J].

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GREENWALD, AC .

APPLIED PHYSICS LETTERS, 1979, 35 (03) :282-285

[6] ELECTRON-BEAM ANNEALING OF ION-IMPLANTATION DAMAGE IN INTEGRATED-CIRCUIT DEVICES [J].

KAMINS, TI ;

ROSE, PH .

JOURNAL OF APPLIED PHYSICS, 1979, 50 (03) :1308-1311

[7] SILICON SOLAR-CELLS BY HIGH-SPEED LOW-TEMPERATURE PROCESSING [J].

KIRKPATRICK, AR ;

MINNUCCI, JA ;

GREENWALD, AC .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1977, 24 (04) :429-432

[8]

LAU SS, 1978, APPL PHYS LETT, V33, P235, DOI 10.1063/1.90310

[9] PULSED ELECTRON-BEAMS FOR ANNEALING OF ION-IMPLANTED SILICON [J].

LITTLE, RG ;

GREENWALD, AC ;

MINNUCCI, JA .

IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1979, 26 (01) :1683-1685

[10]

MAENPAA M, UNPUBLISHED

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