PRESSURE-DEPENDENCE OF PHOTOLUMINESCENCE IN INXGA1-XAS/GAAS STRAINED QUANTUM-WELLS

被引:24
作者
HOU, HQ [1 ]
WANG, LJ [1 ]
TANG, RM [1 ]
ZHOU, JM [1 ]
机构
[1] CHINESE ACAD SCI,INST PHYS,BEIJING 100080,PEOPLES R CHINA
来源
PHYSICAL REVIEW B | 1990年 / 42卷 / 05期
关键词
D O I
10.1103/PhysRevB.42.2926
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Photoluminescence properties of InxGa1-xAs/GaAs strained quantum wells with well widths from 13 to 120 are investigated as a function of hydrostatic pressure (0-45 kbar) at liquid-nitrogen temperature. Pressure coefficients of the E1h transitions between the quantized ground levels of the conduction band and the heavy-hole valence band are presented. A weak recombination with a pressure coefficient of -2.6 meV/kbar is identified, which is attributable to the transition related to the crossover of the band in the well layer and the X band in the barrier layer. Correlating this transition to barrier-to-well indirect recombination, the valence-band-offset fraction is given as Qv=Ev/(Ev+Ec)=0.32 for a sample with indium fraction of x=0.25. The light-hole band is, therefore, inferred to be type II. Furthermore, the pressure coefficient is found to increase with decreasing well widths, which is opposite to that observed in the GaAs/(Al,Ga)As quantum-well system. A calculation based on the envelope-function model is made to interpret this dependence. © 1990 The American Physical Society.
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页码:2926 / 2931
页数:6
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