EFFECT OF ANODE BIAS ON PLASMA-CONFINEMENT IN DIRECT-CURRENT MAGNETRON DISCHARGES

被引：12

作者：

DOYLE, JR

NURUDDIN, A

ABELSON, JR

机构：

[1] UNIV ILLINOIS,COORDINATED SCI LAB,URBANA,IL 61801

[2] UNIV ILLINOIS,DEPT MAT SCI,URBANA,IL 61801

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1994年 / 12卷 / 03期

关键词：

D O I：

10.1116/1.579273

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：886 / 888

页数：3

共 8 条

[1]

Cherrington B., 1982, PLASMA CHEM PLASMA P, V2, P113, DOI [10.1007/BF00633129, DOI 10.1007/BF00633129]

[2]

CLEMENTS RM, 1978, J VAC SCI TECHNOL, V15, P193, DOI 10.1116/1.569453

[3]

FITZNER M, UNPUB

[4] ELECTRON-ENERGY DISTRIBUTION FUNCTION IN A DC MAGNETRON SPUTTERING DISCHARGE [J].

IVANOV, I ;

STATEV, S ;

ORLINOV, V ;

SHKEVOV, R .

VACUUM, 1992, 43 (08) :837-842

[5] ELECTRIC PROBES IN PLASMAS [J].

LIPSCHULTZ, B ;

HUTCHINSON, I ;

LABOMBARD, B ;

WAN, A .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03) :1810-1816

[6] APPLICATION OF THE LANGMUIR PROBE IN SPUTTERING TECHNIQUES [J].

NORSTROM, H ;

OLAISON, R ;

BERG, S ;

ANDERSSON, LP .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (12) :2680-2682

[7] ELECTROSTATIC-PROBE MEASUREMENTS IN THE GLOW-DISCHARGE PLASMA OF A DC MAGNETRON SPUTTERING SYSTEM [J].

PETROV, I ;

ORLINOV, V ;

IVANOV, I ;

KOURTEV, J .

CONTRIBUTIONS TO PLASMA PHYSICS, 1988, 28 (02) :157-167

[8]

PINARBASI M, 1989, TTHIN SOLID FILMS, V171, P517

← 1 →