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APPLICATION OF THE LANGMUIR PROBE IN SPUTTERING TECHNIQUES

被引：3
作者：
NORSTROM, H
OLAISON, R
BERG, S
ANDERSSON, LP
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 12期
关键词：
D O I：
10.1149/1.2129571
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：2680 / 2682
页数：3
相关论文
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[4]   MEASUREMENT OF PLASMA DISCHARGE CHARACTERISTICS FOR SPUTTERING APPLICATIONS [J].
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[6]   DIAGNOSTIC METHODS FOR SPUTTERING PLASMAS [J].
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