THE EFFECT OF REACTANT GAS-COMPOSITION ON THE PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF TIN

被引：20

作者：

JANG, DH ^{[1
]}

CHUN, JS ^{[1
]}

KIM, JG ^{[1
]}

机构：

[1] DAEWOO HEAVY IND CO LTD,CTR TECH,INCHEON 134,SOUTH KOREA

来源：

THIN SOLID FILMS | 1989年 / 169卷 / 01期

关键词：

18;

D O I：

10.1016/S0040-6090(89)80005-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：57 / 68

页数：12

共 18 条

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[2]

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[3]

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[5] COMPOSITION, MORPHOLOGY AND MECHANICAL-PROPERTIES OF PLASMA-ASSISTED CHEMICALLY VAPOR-DEPOSITED TIN FILMS ON M2-TOOL STEEL [J].

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[7]

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[8]

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[9]

KIKUCHI N, 1984, 9TH P INT C CHEM VAP, P728

[10] DEPENDENCE OF THE HARDNESS OF TITANIUM NITRIDE PREPARED BY PLASMA CHEMICAL VAPOR-DEPOSITION ON THE GAS-FLOW RATE AND THE R-F POWER [J].

MAKABE, R ;

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THIN SOLID FILMS, 1986, 137 (01) :L49-L50

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