共 7 条
[1]
MULTIPOLE CONFINED DIFFUSION PLASMA PRODUCED BY 13.56 MHZ ELECTRODELESS SOURCE
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1989, 7 (06)
:3345-3350
[2]
PLASMA-DIFFUSION FROM A LOW-PRESSURE RADIO-FREQUENCY SOURCE
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1991, 9 (03)
:661-663
[3]
HEGERBERG R, 1982, J PHYS B-AT MOL OPT, V15, P797, DOI 10.1088/0022-3700/15/5/022
[4]
MODELING OF PLASMA-FLOW DOWNSTREAM OF AN ELECTRON-CYCLOTRON RESONANCE PLASMA SOURCE
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1990, 8 (03)
:2913-2918
[5]
THE APPLICATION OF THE HELICON SOURCE TO PLASMA PROCESSING
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1991, 9 (02)
:310-317
[7]
VESTAL ML, 1978, PHYS REV A, V17, P1337, DOI 10.1103/PhysRevA.17.1337