ON THE ETCHING OF SILICON BY OXIDANTS IN AMMONIUM FLUORIDE SOLUTIONS - A MECHANISTIC STUDY

[1] MECHANISM OF GALLIUM ARSENIDE DECOMPOSITION BY OXIDIZING AGENTS [J]. ZEITSCHRIFT FUR PHYSIKALISCHE CHEMIE-FRANKFURT, 1969, 64 (1-4): : 187 - +

[2] GERISCHER H, 1966, J ELECTROCHEM SOC, V113, P1174

[3] THE ELECTROCHEMICAL-BEHAVIOR OF N-TYPE SILICON (111)-SURFACES IN FLUORIDE CONTAINING AQUEOUS-ELECTROLYTES [J]. BERICHTE DER BUNSEN-GESELLSCHAFT-PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 1987, 91 (04): : 394 - 398

[4] GERISCHER H, 1957, Z PHYS CHEM, V13, P389

[5] KERN W, 1976, ELECTROCHEMICAL SOC, P1

[6] MAGISTRAGOSTINO M, 1985, ELECTROCHIM ACTA, V30, P373

[7] ANODIC PROPERTIES OF N-SI AND N-GE ELECTRODES IN HF SOLUTION UNDER ILLUMINATION AND IN THE DARK [J]. JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1983, 147 (1-2) : 157 - 166

[8] PHOTOANODIC PROPERTIES OF AN NORMAL-TYPE SILICON ELECTRODE IN AQUEOUS-SOLUTIONS CONTAINING FLUORIDES [J]. JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1983, 144 (1-2): : 113 - 120

[9] ANODIC DISSOLUTION OF SILICON IN HYDROFLUORIC ACID SOLUTIONS [J]. SURFACE SCIENCE, 1966, 4 (02) : 109 - &

[10] SOPORI BL, 1984, J ELECTROCHEM SOC, V131, P667, DOI 10.1149/1.2115670

[1] MECHANISM OF GALLIUM ARSENIDE DECOMPOSITION BY OXIDIZING AGENTS [J]. ZEITSCHRIFT FUR PHYSIKALISCHE CHEMIE-FRANKFURT, 1969, 64 (1-4): : 187 - +

[2] GERISCHER H, 1966, J ELECTROCHEM SOC, V113, P1174

[3] THE ELECTROCHEMICAL-BEHAVIOR OF N-TYPE SILICON (111)-SURFACES IN FLUORIDE CONTAINING AQUEOUS-ELECTROLYTES [J]. BERICHTE DER BUNSEN-GESELLSCHAFT-PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 1987, 91 (04): : 394 - 398

[4] GERISCHER H, 1957, Z PHYS CHEM, V13, P389

[5] KERN W, 1976, ELECTROCHEMICAL SOC, P1

[6] MAGISTRAGOSTINO M, 1985, ELECTROCHIM ACTA, V30, P373

[7] ANODIC PROPERTIES OF N-SI AND N-GE ELECTRODES IN HF SOLUTION UNDER ILLUMINATION AND IN THE DARK [J]. JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1983, 147 (1-2) : 157 - 166

[8] PHOTOANODIC PROPERTIES OF AN NORMAL-TYPE SILICON ELECTRODE IN AQUEOUS-SOLUTIONS CONTAINING FLUORIDES [J]. JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1983, 144 (1-2): : 113 - 120

[9] ANODIC DISSOLUTION OF SILICON IN HYDROFLUORIC ACID SOLUTIONS [J]. SURFACE SCIENCE, 1966, 4 (02) : 109 - &

[10] SOPORI BL, 1984, J ELECTROCHEM SOC, V131, P667, DOI 10.1149/1.2115670