ANALYSIS OF GRATING FORMATION WITH EXCIMER-LASER IRRADIATED PHASE MASKS

被引：122

作者：

DYER, PE

FARLEY, RJ

GIEDL, R

机构：

[1] University of Hull, Department of Applied Physics, Hull, HU6 7RX, Cottingham Road

来源：

OPTICS COMMUNICATIONS | 1995年 / 115卷 / 3-4期

关键词：

D O I：

10.1016/0030-4018(94)00694-P

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Excimer laser irradiated phase masks provide a convenient and effective method for writing micron-scale gratings for optoelectronic device applications. Here we analyze the interference field produced by a periodic mask and assess the near-field energy density and fluence distribution for varying degrees of order content when exposed using an excimer laser with finite spatial and temporal coherence. Results are compared with experimental findings for gratings produced on ablated polymers and in optical fibres.

引用

页码：327 / 334

页数：8

共 21 条

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