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COLOR-BAND GENERATION DURING HIGH DOSE ION-IMPLANTATION OF SILICON WAFERS
被引:5
作者
:
BEANLAND, DG
论文数:
0
引用数:
0
h-index:
0
机构:
AERE,DIV CHEM,HARWELL OX11 0RA,OXFORDSHIRE,ENGLAND
AERE,DIV CHEM,HARWELL OX11 0RA,OXFORDSHIRE,ENGLAND
BEANLAND, DG
[
1
]
CHIVERS, DJ
论文数:
0
引用数:
0
h-index:
0
机构:
AERE,DIV CHEM,HARWELL OX11 0RA,OXFORDSHIRE,ENGLAND
AERE,DIV CHEM,HARWELL OX11 0RA,OXFORDSHIRE,ENGLAND
CHIVERS, DJ
[
1
]
机构
:
[1]
AERE,DIV CHEM,HARWELL OX11 0RA,OXFORDSHIRE,ENGLAND
来源
:
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
1978年
/ 125卷
/ 08期
关键词
:
D O I
:
10.1149/1.2131673
中图分类号
:
O646 [电化学、电解、磁化学];
学科分类号
:
081704 ;
摘要
:
引用
收藏
页码:1331 / 1338
页数:8
相关论文
共 25 条
[21]
INFLUENCE OF TEMPERATURE AND CHANNELING ON ION-BOMBARDMENT DAMAGE IN SI
NELSON, RS
论文数:
0
引用数:
0
h-index:
0
NELSON, RS
MAZEY, DJ
论文数:
0
引用数:
0
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MAZEY, DJ
[J].
CANADIAN JOURNAL OF PHYSICS,
1968,
46
(06)
: 689
-
&
[22]
PARRY PD, 1976, J VAC SCI TECHNOL, V13, P623
[23]
VISIBLE INTERFERENCE EFFECTS IN SILICON CAUSED BY HIGH-CURRENT-HIGH-DOSE IMPLANTATION
SEIDEL, TE
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
SEIDEL, TE
PASTEUR, GA
论文数:
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h-index:
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机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
PASTEUR, GA
TSAI, JCC
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
TSAI, JCC
[J].
APPLIED PHYSICS LETTERS,
1976,
29
(10)
: 648
-
651
[24]
Shannon J. M., 1970, Radiation Effects, V6, P217, DOI 10.1080/00337577008236300
[25]
[No title captured]
←
1
2
3
→
共 25 条
[21]
INFLUENCE OF TEMPERATURE AND CHANNELING ON ION-BOMBARDMENT DAMAGE IN SI
NELSON, RS
论文数:
0
引用数:
0
h-index:
0
NELSON, RS
MAZEY, DJ
论文数:
0
引用数:
0
h-index:
0
MAZEY, DJ
[J].
CANADIAN JOURNAL OF PHYSICS,
1968,
46
(06)
: 689
-
&
[22]
PARRY PD, 1976, J VAC SCI TECHNOL, V13, P623
[23]
VISIBLE INTERFERENCE EFFECTS IN SILICON CAUSED BY HIGH-CURRENT-HIGH-DOSE IMPLANTATION
SEIDEL, TE
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
SEIDEL, TE
PASTEUR, GA
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
PASTEUR, GA
TSAI, JCC
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
TSAI, JCC
[J].
APPLIED PHYSICS LETTERS,
1976,
29
(10)
: 648
-
651
[24]
Shannon J. M., 1970, Radiation Effects, V6, P217, DOI 10.1080/00337577008236300
[25]
[No title captured]
←
1
2
3
→