MEASUREMENT OF ELECTRON-EMISSION DUE TO ENERGETIC ION-BOMBARDMENT IN PLASMA SOURCE ION-IMPLANTATION

被引：102

作者：

SHAMIM, MM

SCHEUER, JT

FETHERSTON, RP

CONRAD, JR

机构：

[1] Engineering Research Center for Plasma-Aided Manufacturing, University of Wisconsin, Madison, WI 53706

来源：

JOURNAL OF APPLIED PHYSICS | 1991年 / 70卷 / 09期

关键词：

D O I：

10.1063/1.349067

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

An experimental procedure has been developed to measure electron emission due to energetic ion bombardment during plasma source ion implantation. Spherical targets (radius = 2 cm) of copper, stainless steel, graphite, titanium alloy (Ti-6Al-4V) and aluminum alloy (6061) were biased negatively to 20, 30, and 40 kV in argon and nitrogen plasmas. A Langmuir probe was used to detect the propagating sheath edge and a Rogowski transformer was used to measure the current to the target. The measurements of electron emission coefficients compare well with those measured under similar conditions [B. Szapiro and J. J. Rocca, J. Appl. Phys. 65, 3713 (1989)].

引用

页码：4756 / 4759

页数：4

共 18 条

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