REFLECTION ELECTRON-MICROSCOPY STUDY OF CLEAN SI(111) SURFACE RECONSTRUCTION DURING THE (7 X 7) REVERSIBLE (1 X-1) PHASE-TRANSITION

被引:69
作者
LATYSHEV, AV
KRASILNIKOV, AB
ASEEV, AL
SOKOLOV, LV
STENIN, SI
机构
[1] Institute of Semiconductor Physics, Academy of Sciences, the USSR
关键词
D O I
10.1016/0039-6028(91)90641-5
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The redistribution of about (4-6) x 10(14) cm-2 atoms on the clean silicon (111) surface during the reversible (7 x 7) reversible (1 x 1) transition has been revealed by the shift of monatomic steps and the change in size of two-dimensional sublimation and growth of islands. The results have been discussed together with the ellipsometric data indicating the presence of about 0.2 monolayer of adatoms on the Si(111)-(1 x 1) surface.
引用
收藏
页码:90 / 96
页数:7
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