GALLIUM-PHOSPHIDE FILMS DEPOSITED BY SPUTTERING

被引：10

作者：

SOSNIAK, J

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1970年 / 7卷 / 01期

关键词：

D O I：

10.1116/1.1315764

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：110 / &

共 22 条

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[2]

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[4]

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[8] INFRA-RED ABSORPTION IN SEMICONDUCTORS [J].

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[9]

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