CHARACTERISTICS OF RARE-EARTH ELEMENT ERBIUM IMPLANTED IN SILICON

被引：97

作者：

TANG, YS

HEASMAN, KC

GILLIN, WP

SEALY, BJ

机构：

来源：

APPLIED PHYSICS LETTERS | 1989年 / 55卷 / 05期

关键词：

D O I：

10.1063/1.101888

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：432 / 433

页数：2

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