PARASITIC ENERGY BARRIERS IN SIGE HBTS

被引:57
作者
SLOTBOOM, JW
STREUTKER, G
PRUIJMBOOM, A
GRAVESTEIJN, DJ
机构
[1] Philips Research Laboratories
关键词
D O I
10.1109/55.116926
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The improvement in electrical performance of SiGe heterojunction bipolar transistors compared to conventional homojunction transistors depends strongly on the position of the SiGe/Si transition relative to the emitter and collector junctions. Parasitic energy barriers can easily be introduced during processing. Measurements and calculations of experimental n-p-n HBT's will be presented, showing that a parasitic conduction-band barrier at the base-collector junction reduces the collector current and the cutoff frequency. A simple analytical model explains the f(T) degradation, caused by the reduction of the collector current and a pileup of minority carriers in the base. With the model the effective height and width of the barrier can also be derived from the measured collector current enhancement factor I(c)(SiGe)/I(c)(Si).
引用
收藏
页码:486 / 488
页数:3
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