CO-2 LASER-INDUCED CVD OF TIN

被引：20

作者：

CONDE, O

FERREIRA, MLG

HOCHHOLDINGER, P

SILVESTRE, AJ

VILAR, R

机构：

[1] UNIV LISBON,CFMC,LISBON,PORTUGAL

[2] INST SUPER TECN,DEPT MAT ENGN,P-1096 LISBON,PORTUGAL

[3] INST SUPER TECN,CEMUL,P-1096 LISBON,PORTUGAL

来源：

APPLIED SURFACE SCIENCE | 1992年 / 54卷

关键词：

D O I：

10.1016/0169-4332(92)90032-S

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Dots and lines of titanium nitride have been deposited on an Incoloy 800H substrate by laser chemical vapour deposition, using a CO2 laser and a reactive atmosphere consisting of TiCl4, N2 and H-2. The shape and the microstructure of the films were analyzed by profilometry and scanning electron microscopy (SEM), respectively. Depending on the deposition conditions, different types of profiles and microstructures are observed.

引用

页码：130 / 134

页数：5

共 8 条

[1]

BAUERLE D, 1984, SPRINGER SERIES CHEM, V39, P179

[2]

BAUERLE D, 1984, SPRINGER SERIES CHEM, V39

[3]

CONDE O, 1990, 3RD P EUR C LAS TREA, P145

[4]

Hedenqvist P., 1989, Surface Engineering, V5, P141